Zeiss Supra 55 VP

Zeiss Supra 55 VP

The electron microscope Zeiss Supra 55 VP is an extraordinarily versatile instrument used to characterize the structure and composition of materials on the nanometer scale. The four available detectors (three of which are sensitive to secondary electrons, and one sensitive to back-scattered electrons) can be partly used under vacuum and partly in a low-pressure mode. The electron microscope is additionally equipped with three additional detectors built by Oxford Instruments. The EDX and the WDX detectors allow a precise element analysis of the samples. The electron microscope features a high current mode so that the sample current is adequate for the WDX measurements. An EBSD detector, which allows the examination of the crystallographic orientation of the samples, is also built into the microscope. The last area of application is lithography: The ELPHY system by Raith allows together with a micropositioning table built by Kammrath & Weiss the seamless exposure of large areas with a positioning accuracy of 100 nm.

Person in charge

Please contact Stephan Puchegger if you need further information.

Specifications

Resolution1.0 nm @ 15 kV
1.7 nm @ 1 kV
3.5 nm @ 0.2 kV
2.0 nm @ 30 kV (VP mode)
VP vacuum2–133 Pa, adjustable in 1 Pa steps
Magnification12–900,000×
CathodeField emission
Accelerating Voltage0.02–30 kV
Sample current4 pA–100 nA
DetectorsInlense
Secondary electron
VPSE
4Q–BSD
EDX
WDX
EBSD
Sample chamber330 mm (Ø) × 270 mm (h)
1 EDS port 35° TOA
CCD camera with IR illumination
Sample stageX = 130 mm
Y = 130 mm
X/Y positioning accuracy = 2 um
Z = 50 mm
T = −3 bis 70°
R = 360° (continuous)
Micro sample stageX = 20 mm
Y = 20 mm
X/Y positioning accuracy = 100 nm
Peltier moduleTemperature range = −50 up to 100°C