Mantis HEX Deposition System

Mantis HEX Deposition System

The Mantis HEX is a flexible system that allows for the deposition of thin layers under high-vacuum. It has a modular design and can be easily reconfigured with an arbitrary combination of e-beam, sputtering and thermal evaporation sources.

The vacuum chamber consists of a six-faceted frame with exchangeable panels which can be exchanged easily after removing a few wing nuts. Thus every intended configuration can be implemented within a few minutes.

Restrictions because of COVID-19

Since the number of persons allowed in a lab at the same time is limited by the COVID-19 rules drawn up by the university, the following regulations apply:

  • Only ONE user with any type of mask or TWO users with FFP2/3 masks (and at that ONLY during training or a course) is/are allowed in the room. There are NO exceptions to this rule.
  • Coating samples for SEM measurement has absolute priority. Users of other equipment must leave the room meanwhile.
  • You may not wait in the lab or in other rooms of the faculty center for e.g. the vacuum to reach a certain level, so that other users can access equipment in the lab in the meantime.
  • You are only allowed to work in lab 3346 after reserving the lab via an entry in the respective u:Cloud calendar. Please contact Stephan Puchegger, who will then share the u:Cloud calendar with you.
  • The calendar also serves as a means of COVID user tracking. Please modify your entry afterwards so that it reflects your actual time in the lab and includes the full names of all persons.
  • Vent the room by opening the window at regular intervals.
  • Disinfect the equipment after finishing your work.

Person in charge

Please contact Stephan Puchegger if you need further information. He will relay your request to the person currently in charge of the system.

Specifications

The sample stage is located at the top of the chamber with the samples facing down. Either a single 4" wafer or several smaller samples can be mounted. The sample stage can be rotated (2–20 rpm) in order to guarantee the uniformity of the deposited films. The sample stage can be lifted from the vacuum chamber and placed on a tabletop after turning it over. This allows for rapid and easy sample loading. 

The following evaporation sources are available:

  • 1 2" magnetron sputter source (for non-magnetic materials with a thickness of 1–6 mm and magnetic materials with a thickness up to 1 mm)
  • 1 e-beam evaporator
  • 2 single boat thermal evaporators which are suitable for both metals and organics/polymers

The system is equipped with quartz balance so that the deposition rate and amount can be controlled.