High-Accuracy Measurement of Refractive Indices in GaAs/AlGaAs Thin-Film Heterostructures

Autor(en)

Lukas W. Perner, Gar-Wing Truong, David Follman, Maximilian Prinz, Georg Winkler, Stephan Puchegger, Garrett D. Cole, Oliver H. Heckl

Abstrakt

Accurate knowledge of the refractive index, n, of optical materials is required for the development of many optical devices in the visible (VIS), near- (NIR) and mid-infrared (MIR) spectral regions, such as lasers, light-emitting and super-luminescent diodes, and distributed Bragg reflectors (DBRs). Typically, n shows a variability depending on deposition conditions, which motivates the need for routine characterization of as-produced structures. While several measurement methods for n exist, among them (spectroscopic) ellipsometry and Fourier-transform infrared (FTIR) refractometry, they all come with their (dis-)advantages, e.g., accurate goniometric measurements or high-resolution FTIR [1].

Organisation(en)

Fakultätszentrum für Nanostrukturforschung

Externe Organisation(en)

Thorlabs Crystalline Solutions

DOI

https://doi.org/10.1109/CLEO/Europe-EQEC57999.2023.10232458

Publikationsdatum

06-2023

Peer-reviewed

Ja

ÖFOS 2012

104026 Spektroskopie, 103021 Optik, 103018 Materialphysik, 205019 Materialwissenschaften

ASJC Scopus Sachgebiete

Electronic, Optical and Magnetic Materials, Instrumentation, Atomic and Molecular Physics, and Optics

Link zum Portal

https://ucrisportal.univie.ac.at/de/publications/a25f88ae-932d-4c6d-b177-2ebe6e0b8016