High-Accuracy Measurement of Refractive Indices in GaAs/AlGaAs Thin-Film Heterostructures

Author(s)

Lukas W. Perner, Gar-Wing Truong, David Follman, Maximilian Prinz, Georg Winkler, Stephan Puchegger, Garrett D. Cole, Oliver H. Heckl

Abstract

Accurate knowledge of the refractive index, n, of optical materials is required for the development of many optical devices in the visible (VIS), near- (NIR) and mid-infrared (MIR) spectral regions, such as lasers, light-emitting and super-luminescent diodes, and distributed Bragg reflectors (DBRs). Typically, n shows a variability depending on deposition conditions, which motivates the need for routine characterization of as-produced structures. While several measurement methods for n exist, among them (spectroscopic) ellipsometry and Fourier-transform infrared (FTIR) refractometry, they all come with their (dis-)advantages, e.g., accurate goniometric measurements or high-resolution FTIR [1].

Organisation(s)

Faculty Center for Nano Structure Research

External organisation(s)

Thorlabs Inc.

DOI

https://doi.org/10.1109/CLEO/Europe-EQEC57999.2023.10232458

Publication date

06-2023

Peer reviewed

Yes

Austrian Fields of Science 2012

104026 Spectroscopy, 103021 Optics, 103018 Materials physics, 205019 Material sciences

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials, Instrumentation, Atomic and Molecular Physics, and Optics

Portal url

https://ucris.univie.ac.at/portal/en/publications/highaccuracy-measurement-of-refractive-indices-in-gaasalgaas-thinfilm-heterostructures(a25f88ae-932d-4c6d-b177-2ebe6e0b8016).html